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UPW Purification

Bubble-free UPW purification for immersion lithography scanner applications

Entegris brings technologies and competencies together in the LiquidLens™ UPW purification system to enable immersion lithography process advancements. The new high-flow system ensures ultrapure, consistent water quality to preserve optic's life by controlling contaminants at the point of use such as dissolved gases, micro bubbles and particles. It also maintains maximum temperature control by incorporating the pHasor® X heat exchanger, which provides optimum heat transfer while preserving absolute fluid purity and the pHasor® II membrane contactor  to ensure the process water is free of bubbles while maintaining absolute purity.

 

LiquidLens® EX High Flow UPW Purification System
UPW Purification with higher flow and service to multiple scanners
  • Ensures the stability and purity of the fluid lens with TOC reduction, Anion/Ion reduction, particle removal, thermal stability and pressure stability/boost
  • Ensures optimum optical properties: maintains stable refractive index, low optical absorbance and minimizes resist interaction
  • Unique design protects against process upsets, caused by seasonal/geographic changes
  • Provides real-time monitoring of critical process parameters